Micro encapsulation of hydrocarbons and chemicals

Details Micro encapsulation of hydrocarbons and chemicals Micro encapsulation of hydrocarbons and chemicals

1995-09-13

1997-10-14

Mai, Ngoclan

Hazardous or toxic waste destruction or containment

Destruction or containment of radioactive waste

By fixation in stable solid media

588252, 588256, 210702, 210751, 405128, 134 29, G21F 900

Patent

active

056782381

ABSTRACT:
A method for cleaning contaminated surfaces or for cleaning bulk contamination of hydrocarbons or chemicals. To clean hydrocarbon or chemical contaminated surfaces, a basic aqueous silica solution is sprayed onto the contaminated surface and allowed to dry. The resulting dry material will flake off, leaving a cleaned surface, without damaging the surface. To clean bulk contamination of hydrocarbons or chemicals, the basic silica solution is mixed with hydrocarbons or chemicals and then an acidic aqueous polymer solution is added and mixed. An amorphous silica material is immediately formed which permanently encapsulates the hydrocarbons or chemicals and which dries to an inert powder.

REFERENCES:
patent: 4347150 (1982-08-01), Arpin
patent: 4482481 (1984-11-01), Bandyopadhyay et al.
patent: 4505851 (1985-03-01), Funabashi et al.
patent: 4518508 (1985-05-01), Conner
patent: 4581162 (1986-04-01), Kawamura et al.
patent: 4600514 (1986-07-01), Conner
patent: 4622175 (1986-11-01), Tamata et al.
patent: 5295761 (1994-03-01), Heacock et al.
patent: 5306351 (1994-04-01), Anderson
patent: 5352296 (1994-10-01), Wittel et al.
patent: 5527982 (1996-06-01), Pal et al.

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