Micro-electromechanical resonators having...

Metal working – Method of mechanical manufacture – Electrical device making

Reexamination Certificate

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C310S312000, C333S186000

Reexamination Certificate

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08061013

ABSTRACT:
A micro-electromechanical resonator includes an electrically-trimmed resonator body having at least one stiffness-enhanced semiconductor region therein containing metal-semiconductor lattice bonds. These metal-semiconductor lattice bonds may be gold-silicon lattice bonds and/or aluminum-silicon lattice bonds. A surface of the resonator body is mass-loaded with the metal, which may be provided by a plurality of spaced-apart metal islands. These metal islands may be aligned along a longitudinal axis of the resonator body. A size of the at least one stiffness-enhanced polycrystalline semiconductor region may be sufficient to yield an increase in resonant frequency of the resonator body relative to an otherwise equivalent resonator having a single crystal resonator body that is free of mass-loading by the metal.

REFERENCES:
patent: 6381022 (2002-04-01), Zavracky
patent: 7236066 (2007-06-01), Ebuchi
patent: 7268646 (2007-09-01), Lutz et al.
patent: 7332411 (2008-02-01), McKinnell et al.
patent: 7675389 (2010-03-01), Yamakawa et al.
patent: 2001/0029781 (2001-10-01), Tai et al.
patent: 2002/0074897 (2002-06-01), Ma et al.
patent: 2005/0242904 (2005-11-01), Lutz et al.
patent: 2010/0127596 (2010-05-01), Ayazi et al.
patent: 2359475 (2011-08-01), None
patent: 04-035404 (1992-02-01), None
Courcimault et al., “High-Q Mechanical Tuning of MEMS Resonators Using a Metal Deposition—Annealing Technique,” The 13thInternational Conference on Solid-State Sensors, Actuators and Microsystems, Seoul, Korea, Jun. 5-9, 2005, pp. 875-878.
Hsu et al., “In Situ Localized Annealing for Contamination Resistance and Enhanced Stability in Nickel Micromechanical Resonators,” 10thInternational Conference on Solid-State Sensors and Actuators, Sendai, Japan, Jun. 7-10, 1999, pp. 932-935.
International Preliminary Report on Patentability Corresponding to International Application No. PCT/US2009/065489; Date of Mailing: Jun. 9, 2011; 10 pages.
Invitation to Pay Additional Fees, International Application No. PCT/US2009/065489, Jun. 2, 2010.
Krause et al., “Determination of aluminum diffusion parameters in silicon,” Journal of Applied Physics, vol. 91, No. 9, May 1, 2002, pp. 5645-5649.
Notification of Transmittal of the International Search Report and the Written Opinion of the International Searching Authority, or the Declaration, PCT/US2009/065489, Jul. 12, 2010.
Hsu et al., “Frequency Trimming for MEMS Resonator Oscillators.” Discera Inc., Ann Arbor, Michigan whsu@discera.com (2007).
Courcimault et al., “High-Q Mechanical Tuning of MEMS Resonators Using a Metal Deposition—Annealing Technique,” Transducers '05 The 13thInternational Conference on Solid-State Sensors, Actuators and Microsystems, Seoul, Korea, Jun. 5-9, 2005.
Sundaresan et al., “Electronically Temperature Compensated Silicon Bulk Acoustic Resonator Reference Oscillators,” IEEE Journal of Solid-State Circuits 42:1425-1434. (2007).
Pourkamali et al., “Low-Impedance VHF and UHF Capacitive Silicon Bulk Acoustic Wave Resonators—Part I: Concept and Fabrication,” IEEE Transactions on Electron Devices 54:2017-2023 (2007).
Samarao et al., “Post-Fabrication Electrical Trimming of Silicon Bulk Acoustic Resonators Using Joule Heating,” 22ndIEEE International Conference on Micro Electro Mechanical Systems MEMS 2009, Sorrento, Italy. Jan. 25-29, 2009.

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