Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2008-01-22
2008-01-22
Baumeister, B. William (Department: 2891)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C257S432000, C257SE21499, C359S223100
Reexamination Certificate
active
07320899
ABSTRACT:
A method of forming a micro-display includes forming a device that includes forming a partially reflecting layer on a first substrate and forming a plate overlying the partially reflecting layer, and adhering the device to a second substrate.
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Chen Chien-Hua
Faase Kenneth
Haluzak Charles C
Regan Michael J.
Sand Kirby
Baumeister B. William
Fulk Steven J.
Hewlett--Packard Development Company, L.P.
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