Micro devices manufacturing method and apparatus therefor

Abrading – Machine – Rotary reciprocating tool

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Details

430 22, B24B 700

Patent

active

061100218

ABSTRACT:
An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.

REFERENCES:
patent: 5435772 (1995-07-01), Yu

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