Micro defects in semi-conductors

Optics: measuring and testing – By dispersed light spectroscopy – With sample excitation

Reexamination Certificate

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C438S007000, C438S016000, C250S458100

Reexamination Certificate

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07113276

ABSTRACT:
The invention relates to a method and apparatus for detecting defects in a semiconductor or silicon structure at room temperature, and in an efficient time, using photoluminescence. The invention employs the use of a high intensity beam of light preferably having a spot size between 0.1 mm–0.5 microns and a peak or average power density of 104–109w/cm2with a view to generating a high concentration of charge carriers, which charge characters detect defects in a semiconductor by interacting with same. These defects are visible by producing a photoluminescence image of the semiconductor. Several wavelengths may be selected to identify defects at a selective depth as well as confocal optics may be used.

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Moore, 1990, J Crystal Growth, 103:21-7.
Pritchard et al., 1993, Semiconductor Science and Technology, 8:1166-72.
Ribes et al., 1995, Applied Physics Letters, 66:2321-3.

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