Micro-connector structure and fabricating method thereof

Electrical connectors – Adapted to cooperate with duplicate connector – Contact intermeshable with duplicate mating contact

Reexamination Certificate

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Details

C439S492000, C439S284000, C439S287000, C439S931000, C439S886000

Reexamination Certificate

active

06994578

ABSTRACT:
MICRO-CONNECTOR STRUCTURE AND method of making the same are disclosed. The micro-connector is microminiaturized and improved its degree of compaction by using semiconductor process. The process is etching silicon substrates into V-shaped channels and then a layer of nanometer structure is grown on them to increase stability of conductivity.

REFERENCES:
patent: 5071363 (1991-12-01), Reylek et al.

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