Micro-casted silicon carbide nano-imprinting stamp

Details Micro-casted silicon carbide nano-imprinting stamp Micro-casted silicon carbide nano-imprinting stamp

2006-07-25

2006-07-25

Colilla, Daniel J. (Department: 2854)

Printing

Embossing or penetrating

Die members

C977S887000

Reexamination Certificate

active

07080596

ABSTRACT:
A micro-casted silicon carbide nano-imprinting stamp and method of making a micro-casted silicon carbide nano-imprinting stamp are disclosed. A micro-casting technique is used to form a foundation layer and a plurality of nano-sized features connected with the foundation layer. The foundation layer and the nano-sized features are unitary whole that is made entirely from a material comprising silicon carbide (SiC) which is harder than silicon (Si) alone. As a result, the micro-casted silicon carbide nano-imprinting stamp has a longer service lifetime because it can endure several imprinting cycles without wearing out or breaking. The longer service lifetime makes the micro-casted silicon carbide nano-imprinting stamp economically feasible to manufacture as the manufacturing cost can be recouped over the service lifetime.

REFERENCES:
patent: 3973495 (1976-08-01), Rowe
patent: 6309580 (2001-10-01), Chou

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