Metrological structures particularly for direct measurement of e

Details Metrological structures particularly for direct measurement of e Metrological structures particularly for direct measurement of e

1995-06-07

1999-11-16

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

G03F 900

Patent

active

059854944

ABSTRACT:
Process for producing metrological structures particularly for direct measurement of errors introduced by alignment systems, whose peculiarity consists in performing, on a same substrate, metrological alignment markings and processed alignment markings according to arrays of preset numerical size.

REFERENCES:
patent: 4125427 (1978-11-01), Chen et al.
patent: 4650744 (1987-03-01), Amano
patent: 5246539 (1993-09-01), Canestrari et al.
patent: 5407763 (1995-04-01), Pai
patent: 5436199 (1995-07-01), Brighton
IBM Technical Disclosure Bulletin, vol. 26, No. 10B, Mar. 1984,New York US, p. 5395, H.R. Rottmann "Method For Statistical Performance Measurements Of A Lithographic System".
International Electron Devices Meeting, Dec. 6-9, 1987, Washington US, Technical Digest 1988, New York, US, pp. 749-752K, Yamashita et al. "Holographic Nanometer Alignment System For A Half-Micron Wafer Stepper".
Patent Abstracts of Japan, vol. 13, No. 168 (E-747) Apr. 21, 1989 & JP-A-64001232 (Mitsubishi Electric Corp.).

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