Methods of splitting CdZnTe layers from CdZnTe substrates...

Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates – Subsequent separation into plural bodies

Reexamination Certificate

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C257SE21088, C257SE21567, C257SE21568, C438S455000, C438S456000, C438S457000

Reexamination Certificate

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07972938

ABSTRACT:
Methods of producing CdZnTe (CZT) layers for the epitaxial growth of HgCdTe thereon include implanting ions into a CZT substrate at a low temperature to form a damaged layer underneath a CZT surface layer, bonding a wafer to the CZT substrate about the CZT surface layer using a bonding material, and, annealing the CZT substrate for a time sufficient to facilitate the splitting of the CZT substrate at the damaged layer from the CZT surface layer.

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S. Stolyarova, N. Amir and Y. Nemirovsky , Rapid thermal processing of epitaxial II-VI heterostructures, Journal of Crystal Growth, vols. 198-199, Part 2, Mar. 1999, pp. 1157-1161.
Tony, Qin-Yi and Gosele, Ulrich M., Wafer Bonding and Layer Splitting for Microsystems; Advanced Materials, vol. II, No. 17, 1999, pp. 409-1425.

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