Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1998-10-01
2000-09-19
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
G03F 900
Patent
active
06120952&
ABSTRACT:
Methods of reducing proximity effects in lithographic processes wherein an integrated circuitry pattern is transferred from a mask onto a semiconductor substrate are described. In one embodiment, a desired spacing is defined between a main feature which is to reside on a mask and which is to be transferred onto the substrate, and an adjacent proximity effects-correcting feature. After the spacing definition, the dimensions of the main feature are adjusted relative to the proximity effects-correcting feature to achieve a desired transferred main feature dimension. In another embodiment, a desired spacing is defined between a main feature having an edge and an adjacent sub-resolution feature. The edge of the main feature is moved relative to the sub-resolution feature to achieve a desired transferred main feature dimension.
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Baggenstoss William
Burdorf James E.
Pierrat Christophe
Stanton William
Micro)n Technology, Inc.
Young Christopher G.
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