Methods of providing uniform gas delivery to a reactor

Details Methods of providing uniform gas delivery to a reactor Methods of providing uniform gas delivery to a reactor

2011-07-19

2011-07-19

Chen, Bret (Department: 1715)

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

C427S255280, C117S084000, C117S088000

Reexamination Certificate

active

07981472

ABSTRACT:
A method of introducing gasses through a gas distribution system into a reactor involves flowing the gasses through at least two distinct gas source orifice arrays displaced from one another along an axis defined by a gas flow direction from the gas source orifice arrays towards a work-piece. During different time intervals, a purge gas and different reactive precursors are flowed into the reactor from different ones of the gas source orifice arrays. One of the precursors may be associated with a soft saturating atomic layer deposition half reaction and another of the precursors associated with a strongly saturating atomic layer deposition half reaction. An upper one of the gas source orifice arrays may be a relatively planar gas orifice array.

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