Methods of manufacturing photomask blank and photomask

Details Methods of manufacturing photomask blank and photomask Methods of manufacturing photomask blank and photomask

2007-03-27

2007-03-27

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S330000

Reexamination Certificate

active

10724734

ABSTRACT:
A photomask blank having a film of at least one layer formed on a substrate is manufactured by forming a film on a substrate and irradiating the film with light from a flash lamp. A photomask is manufactured from the thus manufactured photomask blank by forming a patterned resist on the film on the blank by photolithography, etching away those portions of the film which are not covered with the resist, and removing the resist. The photomask blank and photomask have minimized warpage and improved chemical resistance.

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