Methods of manufacturing phase shift masks having etched...

Details Methods of manufacturing phase shift masks having etched... Methods of manufacturing phase shift masks having etched...

2006-06-06

2006-06-06

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C216S012000

Reexamination Certificate

active

07056624

ABSTRACT:
Methods of manufacturing a single sided engraving phase shift mask that includes a shifter part and a non-shifter part mutually adjacent on a substrate, and a shading layer pattern formed with a shading film and wherein a side wall part of a dug-down part has round, crooked portions at top and bottom corners of the sidewall part. The method includes forming a resist pattern having a selective opening at the shifter part, forming a dug-down part corresponding to the shifter part by using the resist pattern, wet etching the whole surface at the dug-down part forming side of the substrate, forming a shading film on the substrate, forming a resist pattern on the shading film, and forming a shading pattern having prescribed openings at the shifter part and non-shifter part.

REFERENCES:
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patent: 6340542 (2002-01-01), Inoue et al.
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Levinson, Harry J., Principles of Lithography, 2001, SPIE—The International Society for Optical Engineering, p. 274.

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