Methods of manufacturing electron-emitting device, electron...

Details Methods of manufacturing electron-emitting device, electron... Methods of manufacturing electron-emitting device, electron...

2005-05-24

2005-05-24

Patel, Nimeshkumar D. (Department: 2879)

Electric lamp or space discharge component or device manufacturi

Process

With assembly or disassembly

C445S005000, C445S051000, C438S020000

Reexamination Certificate

active

06896571

ABSTRACT:
In a process of reducing a resistivity of a polymer film for carbonization in a surface conduction electron-emitting device, by irradiating an energy beam onto the polymer film, when an energy intensity of the beam given in a unit area in a unit time is assumed to be W W/m2, W satisfies a formula W≧2×T×(ρsub·Csub·λsub/τ)1/2, where T is defined as a temperature ° C. at which the polymer film is heated for one hour in a vacuum degree of 1×10−4Pa to reduce a resistivity of the polymer film to 0.1 Ω·cm, Csubis a specific heat J/kg·K of the substrate, ρsubis a specific gravity kg/m3of the substrate, λsubis a heat conductivity W/m·K of the substrate, and τ is an irradiation time in the range of 10−9sec to 10 sec.

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