Methods of making thin film capacitors comprising a...

Details Methods of making thin film capacitors comprising a... Methods of making thin film capacitors comprising a...

2007-10-25

2009-10-13

Trinh, Minh (Department: 3729)

Metal working

Barrier layer or semiconductor device making

Barrier layer device making

C438S250000, C438S253000, C361S313000

Reexamination Certificate

active

07601181

ABSTRACT:
Described herein are methods for making articles comprising a dielectric layer formed from any solution composition that can form barium titanate during firing and containing manganese in an amount between 0.002 and 0.05 atom percent of the solution composition, wherein the dielectric layer has been formed on metal foil and fired in a reducing atmosphere.

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