Chemistry of carbon compounds – Miscellaneous organic carbon compounds – C-metal
Patent
1975-03-26
1977-06-07
Sneed, Helen M. S.
Chemistry of carbon compounds
Miscellaneous organic carbon compounds
C-metal
424 66, C07F 700
Patent
active
040283909
ABSTRACT:
Basic zirconium gels may be used to form complexes with conventional aluminum and/or zirconium antiperspirant systems. The freshly prepared basic zirconium gels provide both a buffer for the highly acidic aluminum-zirconium complexes and an additional source of zirconium as an active ingredient in the antiperspirant. The preferred basic zirconium gels are basic zirconium-amino acid compounds, particularly basic zirconium glycinates, and the compounds are preferably added to aluminum-zirconium systems in the form of a wet gel. The preferred basic zirconium glycinate is formed by first reacting sodium carbonate with glycine, and then reacting the resulting sodium glycinate with a zirconium oxy or zirconium hydroxy compound to precipitate out the zirconium basic glycinate gel. The various complexes of the invention may be used in conventional antiperspirant forms, including aqueous solutions, aerosol sprays, powder-in-oil aerosol sprays, creams, lotions, cream sticks, etc.
REFERENCES:
patent: 2236387 (1941-03-01), Wallace et al.
patent: 2814584 (1957-11-01), Daley
patent: 2814585 (1957-11-01), Daley
patent: 2854382 (1958-09-01), Grad
patent: 3407254 (1968-10-01), Siegal et al.
patent: 3792068 (1974-02-01), Luedders et al.
Bretschneider Edward S.
Jones John L.
Rubino Andrew M.
Armour Pharmaceutical Company
Barber Frank T.
Schwarze William W.
Sneed Helen M. S.
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