Methods of making a current-perpendicular-to-the-planes...

Details Methods of making a current-perpendicular-to-the-planes... Methods of making a current-perpendicular-to-the-planes...

2008-04-01

2008-04-01

Kim, Paul D. (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S603130, C029S603150, C029S603180, C216S065000, C360S122000, C360S125330, C360S317000, C427S127000, C427S128000, C451S005000, C451S041000

Reexamination Certificate

active

07350284

ABSTRACT:
In one particular example, a plurality of CPP type sensor layers are formed over a wafer and a mask without undercuts is formed over the plurality of CPP type sensor layers in a central region. With the mask without undercuts in place, an ion milling process is started to remove CPP type sensor layer materials left exposed by the mask without undercuts in end regions which surround the central region. The ion milling process is stopped at or near a spacer layer of the CPP type sensor layers. Insulator materials are then deposited in the end regions where the CPP type sensor layer materials were removed, followed by hard bias materials over the insulator materials. The mask without undercuts is then removed through use of a chemical-mechanical polishing (CMP) assisted lift-off process, which also planarizes the top surface.

REFERENCES:
patent: 5650958 (1997-07-01), Gallagher et al.
patent: 5841692 (1998-11-01), Gallagher et al.
patent: 6271998 (2001-08-01), Coehoorn et al.
patent: 6353318 (2002-03-01), Sin et al.
patent: 6538861 (2003-03-01), Hayashi et al.
patent: 6674664 (2004-01-01), Pohm
patent: 6718621 (2004-04-01), Hayashi et al.
patent: 7118680 (2006-10-01), Chang et al.
patent: 2002/0036919 (2002-03-01), Daughton et al.
patent: 2003/0030093 (2003-02-01), Agarwal et al.
patent: 2003/0035256 (2003-02-01), Hayashi et al.
patent: 2003/0137780 (2003-07-01), Fontana et al.
patent: 2003/0197988 (2003-10-01), Hasegawa et al.
patent: 2003/0231437 (2003-12-01), Childress et al.
patent: 2004/0063223 (2004-04-01), Costrini et al.

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