Methods of forming synthetic diamond coatings on particles using

Details Methods of forming synthetic diamond coatings on particles using Methods of forming synthetic diamond coatings on particles using

1987-03-31

1989-08-22

Beck, Shrive

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427213, 427242, 423446, 118 501, 118730, B05D 302, B05D 700, B05D 312, B01J 306

Patent

active

048594938

ABSTRACT:
An apparatus and method for applying hard surface coatings to articles of manufacture such as particles, filaments, sphereoids, rollers, bearings, tools, and assemblies. In one form, coating of hard surface film, such as synthetic diamond, is effected while the objects fall freely through space in a coating chamber. In another form, coating is effected while particles are fluidized by gas containing molecules which are formed of matter to be deposited by gas or chemical vapor deposition employing high energy radiation, such as microwave energy and/or other form of radiation. In other forms, an ion beam or beams containing hot carbon ions is directed through a fluidized bed of particles to be coated or through a chamber in which small objects are made to continuously fall freely through space to coat same with carbon in the form of synthetic diamond. In another method, such small objects are caused to continuously tumble through a coating region of a coating chamber into which is directed gas and/or vapor containing molecules of a hydrocarbon, such as methane, and hydrogen, while microwave energy is directed through such region. Other forms of the invention include the selective deposition and coating of synthetic diamond onto substrates to form or protect microminiature electronic circuits and circuit elements such as transistors and interconnects and to protect bonds such as welds, or to form bonds between components joined together thereby. In yet another form, hard synthetic diamond coatings are deposited per se or in combination with other materials, by a hybrid process including chemical vapor deposition, ion deposition by beam(s), sputtering and the like.

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patent: 4615905 (1986-10-01), Ovshinsky
patent: 4756964 (1988-07-01), Kincaid et al.
patent: 4767608 (1988-08-01), Matsumoto et al.

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