Methods of forming integrated optoelectronic devices

Details Methods of forming integrated optoelectronic devices Methods of forming integrated optoelectronic devices

2005-09-13

2005-09-13

Ahmed, Shamim (Department: 1765)

Etching a substrate: processes

Forming or treating optical article

C216S002000, C216S017000, C216S018000, C216S066000

Reexamination Certificate

active

06942814

ABSTRACT:
Methods of forming optoelectronic devices include forming an electrically conductive layer on a first surface of a substrate and forming a mirror backing layer from the electrically conductive layer by forming an endless groove that extends through the electrically conductive layer. A step is then performed to remove a portion of the substrate at a second surface thereof, which extends opposite the first surface. This step exposes a front surface of the mirror backing layer. An optically reflective mirror surface is then formed on the front surface of the mirror backing layer.

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