Semiconductor device manufacturing: process – Having magnetic or ferroelectric component
Reexamination Certificate
2006-12-22
2009-10-06
Pert, Evan (Department: 2826)
Semiconductor device manufacturing: process
Having magnetic or ferroelectric component
C369S126000, C365S145000
Reexamination Certificate
active
07598096
ABSTRACT:
Methods and associated structures of forming a microelectronic device are described. Those methods may comprise forming a conductive layer on a single crystal ferroelectric material, patterning the conductive layer to form contacts, attaching a portion of a circuit on the patterned conductive layer, lapping the single crystal ferroelectric material to a thickness of about 1 to about 10 microns and then etching the single crystal to a thickness below about 25 nm.
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Intel Corporation
Kathy Ortia on behalf of Intel Corporation
Pert Evan
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