Methods of forming back side layers for thinned wafers

Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates – Warping of semiconductor substrate

Reexamination Certificate

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C438S458000, C438S459000

Reexamination Certificate

active

07871899

ABSTRACT:
A method of processing a wafer including a plurality of integrated circuit devices on a front side of the wafer, may include thinning the wafer from a back side opposite the front side. After thinning the wafer, a back side layer may be provided on the back side of the thinned wafer opposite the front side, and the back side layer may be configured to counter stress on the front side of the wafer including the plurality of integrated circuit devices thereon. After providing the back side layer, the plurality of integrated circuit devices may be separated. Related structures are also discussed.

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