Methods of forming alternating phase shift masks having...

Details Methods of forming alternating phase shift masks having... Methods of forming alternating phase shift masks having...

2007-09-04

2007-09-04

Rosasco, S. (Department: 1756)

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Inflatable connector

C430S394000

Reexamination Certificate

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10798908

ABSTRACT:
Methods for fabricating alternating phase shift masks or reticles used in semiconductor optical lithography systems. The methods generally include forming a layer of phase shift mask material on a handle substrate and patterning the layer to define recessed phase shift windows. The patterned layer is transferred from the handle wafer to a mask blank. The depth of the phase shift windows is determined by the thickness of the layer of phase shift mask material and is independent of the patterning process. In particular, the depth of the phase shift windows is not dependent upon the etch rate uniformity of an etch process across a surface of a mask blank.

REFERENCES:
patent: 5194346 (1993-03-01), Rolfson et al.
patent: 5773171 (1998-06-01), Lee et al.
patent: 6048652 (2000-04-01), Nguyen et al.
patent: 6187480 (2001-02-01), Huang
patent: 6376130 (2002-04-01), Stanton
patent: 6660653 (2003-12-01), Tzu et al.
patent: 2002/0195673 (2002-12-01), Chou et al.
patent: 2005/0158634 (2005-07-01), Thony et al.
P. F. Garcia et al., “Thin Films for Phase-Shift Masks,” published in Vacuum and Thin Film, IHS Publishing Gorup, 14-21, Sep. 1999.

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