Methods of forming a silicon nitride film, a capacitor dielectri

Details Methods of forming a silicon nitride film, a capacitor dielectri Methods of forming a silicon nitride film, a capacitor dielectri

1997-04-22

1999-03-16

Bowers, Charles

Semiconductor device manufacturing: process

Making passive device

Stacked capacitor

438703, 438757, 438791, 438775, A10L 21318

Patent

active

058829784

ABSTRACT:
A method of forming silicon nitride includes, a) forming a first layer comprising silicon nitride over a substrate; b) forming a second layer comprising silicon on the first layer; and c) nitridizing silicon of the second layer into silicon nitride to form a silicon nitride comprising layer, said silicon nitride comprising layer comprising silicon nitride of the first and second layers. Further, a method of forming a capacitor dielectric layer of silicon nitride includes, a) forming a first capacitor plate layer; b) forming a first silicon nitride layer over the first capacitor plate layer; c) forming a silicon layer on the silicon nitride layer; d) nitridizing the silicon layer into a second silicon nitride layer; and e) forming a second capacitor plate layer over the second silicon nitride layer. Also, a method of forming a capacitor dielectric layer over a capacitor plate layer includes, a) forming a first layer of dielectric material over a capacitor plate layer; b) conducting a pin-hole widening wet etch of the first layer; and c) after the wet etch, forming a pin-hole plugging second layer of dielectric material on the first layer and within the widened pin-holes.

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