Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2006-04-18
2006-04-18
Nelms, David (Department: 2818)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C438S060000, C438S073000
Reexamination Certificate
active
07029944
ABSTRACT:
A method of forming a microlens structure is provided along with a CCD array structure employing a microlens array. An embodiment of the method comprises providing a substrate having a surface with photo-elements on the surface; depositing a transparent material overlying the surface of the substrate; depositing a CMP stop overlying the transparent material; depositing a lens-shaping layer overlying the CMP stop layer; depositing and patterning a photoresist layer overlying the lens-shaping layer to form openings to expose the lens-shaping layer; introducing a first isotropic etchant into the openings and etching the lens-shaping layer where exposed to form initial lens shapes having a radius; stripping the photoresist; exposing the lens-shaping layer to a second isotropic etchant to increase the radius of the lens shapes; transferring the lens shape through the CMP stop layer into the transparent material using an anisotropic etch; and depositing a lens material overlying the transparent material, whereby the lens shapes are at least partially filled with lens material. Planarizing the lens material using CMP and stopping at the CMP stop layer.
REFERENCES:
patent: 5324623 (1994-06-01), Tsumori
patent: 5593913 (1997-01-01), Aoki
patent: 5595930 (1997-01-01), Baek
patent: 6104021 (2000-08-01), Ogawa
patent: 6163407 (2000-12-01), Okazaki et al.
patent: 6171885 (2001-01-01), Fan et al.
patent: 6291811 (2001-09-01), Ogawa
patent: 6379993 (2002-04-01), Nakano et al.
patent: 6423569 (2002-07-01), Zhang et al.
patent: 6437918 (2002-08-01), Hamanaka et al.
patent: 6737719 (2004-05-01), Yamamoto
patent: 6803250 (2004-10-01), Yaung et al.
patent: 6803261 (2004-10-01), Zhang et al.
patent: 6872584 (2005-03-01), Nakashiba
patent: 6878564 (2005-04-01), Silverbrook
patent: 6940654 (2005-09-01), Tang
patent: 2004/0080005 (2004-04-01), Yamamoto
patent: 2004/0171184 (2004-09-01), Maruyama et al.
patent: 2004/0211884 (2004-10-01), Fang et al.
Conley, Jr. John F.
Evans David R.
Gao Wei
Ono Yoshi
Goodwin David
Nelms David
Ripma David C.
Sharp Laboratories of America Inc.
LandOfFree
Methods of forming a microlens array over a substrate... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Methods of forming a microlens array over a substrate..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods of forming a microlens array over a substrate... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3576189