Methods of fabricating dual anode, flat panel electrophoretic di

Radiation imagery chemistry: process – composition – or product th – Liquid crystal process – composition – or product

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430312, 430314, 430316, 430319, 430318, 430329, 430394, 428 1, 204299R, 359296, C09K 1900

Patent

active

050771574

ABSTRACT:
There is disclosed methods for fabricating electrophoretic displays. Essentially the methods employ selective materials such as different metals which are capable of being etched by different etchants. In this manner, a laminate is provided to form a grid matrix which is insulated from a cathode matrix which grid matrix is also insulated from a second anode matrix. The entire display utilizes a local or second anode and a remote anode to further control pigment particle migration. The display is fabricated by two methods both of which employ selective etching of the parallel line type of display electrodes which constitute a cathode, a grid and a local anode.

REFERENCES:
patent: 3668106 (1972-06-01), Ota
patent: 4203106 (1980-05-01), Dalisa et al.
patent: 4218302 (1980-08-01), Dalisa et al.
patent: 4522472 (1985-06-01), Liebert et al.
patent: 4655897 (1987-04-01), DiSanto et al.
patent: 4680103 (1987-07-01), Beilin et al.
patent: 4732830 (1988-03-01), DiSanto et al.
patent: 4772820 (1988-09-01), DiSanto et al.
patent: 4850919 (1989-07-01), DiSanto et al.

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