Methods of etching nanodots, methods of removing nanodots...

Etching a substrate: processes – Gas phase and nongaseous phase etching on the same substrate

Reexamination Certificate

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C438S704000

Reexamination Certificate

active

07993539

ABSTRACT:
Embodiments of the invention include methods of etching nanodots, to methods of removing nanodots from substrates, and to methods of fabricating integrated circuit devices. In one embodiment, a method of etching nanodots that include a late transition metal includes exposing such nanodots to a gas comprising a phosphorus and halogen-containing compound and an oxidizing agent. After the exposing, the nanodots which are remaining and were exposed are etched (either partially or completely) with an aqueous solution comprising HF.

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