Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate
2006-10-10
2006-10-10
Tran, Thien F. (Department: 2811)
Semiconductor device manufacturing: process
Chemical etching
Vapor phase etching
C438S780000, C438S781000, C438S782000
Reexamination Certificate
active
07119025
ABSTRACT:
A stabilizing solution for treating photoresist patterns and methods of preventing profile abnormalities, toppling and resist footing are disclosed. The stabilizing solution comprises a non-volatile component, such as non-volatile particles or polymers, which is applied after the photoresist material has been developed. By treating the photoresist with the solution containing a non-volatile component after developing but before drying, the non-volatile component fills the space between adjacent resist patterns and remains on the substrate during drying. The non-volatile component provides structural and mechanical support for the resist to prevent deformation or collapse by liquid surface tension forces.
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Daley Jon
Hishiro Yoshiki
Dickstein & Shapiro LLP
Tran Thien F.
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