Methods of determining quality of a light source

Image analysis – Applications – Manufacturing or product inspection

Reexamination Certificate

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C356S012000, C382S312000

Reexamination Certificate

active

07738692

ABSTRACT:
Methods for determining a quality of a light source applied to a photolithographic process are provided. An image sensor array is exposed to a light from a light source. Addresses and respective intensities corresponding to a plurality of locations on a pupil map representing intensity of the light from on the image sensor array. At least one of an inner curve and an outer curve of the pupil map is defined based upon the collected addresses and respective intensities. The light source is applied to a photolithographic process if the addresses have a predetermined pattern relative to the at least one of the inner curve and the outer curve.

REFERENCES:
patent: 4545683 (1985-10-01), Markle
patent: 4607356 (1986-08-01), Bricot et al.
patent: 4701050 (1987-10-01), Oshida et al.
patent: 4744071 (1988-05-01), Bricot et al.
patent: 5406543 (1995-04-01), Kobayashi et al.
patent: 5432588 (1995-07-01), Kamon
patent: 5477057 (1995-12-01), Angeley et al.
patent: 5537260 (1996-07-01), Williamson
patent: 5541026 (1996-07-01), Matsumoto
patent: 5587834 (1996-12-01), Noguchi
patent: 5677755 (1997-10-01), Oshida et al.
patent: 5706091 (1998-01-01), Shiraishi
patent: 5774222 (1998-06-01), Maeda et al.
patent: 5808724 (1998-09-01), Ina et al.
patent: 5863712 (1999-01-01), Von Bunau et al.
patent: 5888677 (1999-03-01), Nakae
patent: 6198793 (2001-03-01), Schultz et al.
patent: 6201886 (2001-03-01), Nakayama
patent: 6263099 (2001-07-01), Maeda et al.
patent: 6404498 (2002-06-01), Maeda et al.
patent: 6549272 (2003-04-01), Chandhok et al.
patent: 6567155 (2003-05-01), Chandhok et al.
patent: 6700649 (2004-03-01), Chandhok et al.
patent: 6744505 (2004-06-01), Wang et al.
patent: 7030966 (2006-04-01), Hansen
patent: 2001/0046039 (2001-11-01), Kudo
patent: 2001/0055098 (2001-12-01), Chen
patent: 2002/0126267 (2002-09-01), Smith
patent: 2002/0192578 (2002-12-01), Tanaka et al.
patent: 2003/0215616 (2003-11-01), Pierrat
patent: 2004/0156030 (2004-08-01), Hansen
patent: 2004/0257543 (2004-12-01), Dowski, Jr. et al.
patent: 2006/0114440 (2006-06-01), Sekigawa et al.
patent: 1420297 (2004-05-01), None
patent: 1473596 (2006-06-01), None
patent: 2002025898 (2002-01-01), None
patent: 2005353869 (2005-12-01), None
NL Search Report and Written Opinion dated Feb. 11, 2008 regarding Dutch Patent Application No. 2000410. NL.
Office Action dated Dec. 15, 2009 in corresponding Taiwanese Application.

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