Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-07-20
2010-06-15
Le, Vu (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C356S012000, C382S312000
Reexamination Certificate
active
07738692
ABSTRACT:
Methods for determining a quality of a light source applied to a photolithographic process are provided. An image sensor array is exposed to a light from a light source. Addresses and respective intensities corresponding to a plurality of locations on a pupil map representing intensity of the light from on the image sensor array. At least one of an inner curve and an outer curve of the pupil map is defined based upon the collected addresses and respective intensities. The light source is applied to a photolithographic process if the addresses have a predetermined pattern relative to the at least one of the inner curve and the outer curve.
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Chen Nan-Jung
Hung Kevin
Peng Jui-Chung
Yang An-Kuo
Duane Morris LLP
Le Vu
Liew Alex
Taiwan Semiconductor Manufacturing Co. Ltd.
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