Methods of depositing materials on substrates

Coating apparatus – Gas or vapor deposition – Multizone chamber

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118 501, 118715, 204298, 219121EB, C23C 1100

Patent

active

042248973

ABSTRACT:
A vapor deposition process which is carried out in a gaseous environment. The homogeneous nucleation of the vapor species in the gaseous environment is suppressed by heating the gaseous environment.

REFERENCES:
patent: 2948635 (1960-08-01), Koller
patent: 3528387 (1970-09-01), Hamilton
patent: 3984581 (1976-10-01), Dobbler et al.
patent: 4038171 (1977-07-01), Moss et al.
patent: 4041353 (1979-01-01), Penfold et al.

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