Methods of controlling properties and characteristics of a...

Semiconductor device manufacturing: process – With measuring or testing

Reexamination Certificate

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C365S185280

Reexamination Certificate

active

10614354

ABSTRACT:
The present invention is generally directed to various methods of controlling properties and characteristics of a gate insulation layer based upon electrical test data, and a system for performing same. In one illustrative embodiment, the method comprises performing at least one electrical test on at least one semiconductor device, determining at least one parameter of at least one process operation to be performed to form at least one gate insulation layer on a subsequently formed semiconductor device based upon electrical data obtained from the electrical test, and performing at least one process operation comprised of the determined parameter to form the gate insulation layer.

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PCT Search Report from PCT/US2004/017091 dated Oct. 15, 2004.
“Method to Make BICMOS Device Data Available Early in Process,” IBM Technical Disclosure Bulletin, vol. 33, No. 9, pp. 8-9, 1991.

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