Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate
2008-10-29
2011-11-22
Barr, Michael (Department: 1711)
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
C134S002000, C134S003000, C510S175000, C510S176000, C510S407000, C510S412000, C438S199000, C438S745000, C438S754000
Reexamination Certificate
active
08062429
ABSTRACT:
The present invention relates to aqueous compositions comprising amidoxime compounds and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous solutions. The compositions of the invention may optionally contain one or more other acid compounds, one or more basic compounds, and a fluoride-containing compound and additional components such as organic solvents, chelating agents, amines, and surfactants. The invention also relates to a method of removing residue from a substrate during integrated circuit fabrication.
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Barr Michael
Dennis Caitlin N
Dunlap Codding P.C.
EKC Technology, Inc.
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