Fluid handling – Processes – With control of flow by a condition or characteristic of a...
Patent
1980-06-30
1982-02-16
Cline, William R.
Fluid handling
Processes
With control of flow by a condition or characteristic of a...
137 93, 204 52R, 204195R, G05D 1113
Patent
active
043155189
ABSTRACT:
A sample of copper electroless plating solution, containing complexed cupric ions, is modified to provide a concentration of uncomplexed cupric ions. A pH probe (40) monitors the pH level of the modified sample and feeds a signal to a pH control circuit (42) which selectively adds a diluted acid in order to maintain the pH level of the modified sample at a desired level. Specific ion and reference probes (44 and 46) are positioned in the modified sample where, in the presence of uncomplexed cupric ions, a voltage signal is developed. The voltage signal, which is indicative of the copper concentration of the modified sample, is a measure of the copper concentration in the plating solution. A copper control circuit (48), which is responsive to the developed voltage signal, facilitates the addition of cupric ions to the plating solution to maintain a desired ratio of complexer to copper concentration.
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Cline William R.
Hoofnagle J. B.
Western Electric Company Inc.
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