Methods of and apparatuses for controlling process profiles

Details Methods of and apparatuses for controlling process profiles Methods of and apparatuses for controlling process profiles

2008-07-22

2008-07-22

Cabrera, Zoila E (Department: 2123)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S109000

Reexamination Certificate

active

11228004

ABSTRACT:
Presented are methods and apparatus for controlling the processing of a substrate during a process step that is sensitive to one or more process conditions. One embodiment includes a method performed with corresponding apparatus that includes a controller. One step includes constructing a perturbation model relating changes in control parameters for the apparatus to one or more resulting changes in the process. The method also includes the step of using the perturbation model with at least one of a performance objective and a constraint to derive optimized control parameters for the controller. Another step in the method includes operating the controller with the optimized control parameters. Another embodiment includes an apparatus for processing substrates where the apparatus comprises optimized control parameters.

REFERENCES:
patent: RE32369 (1987-03-01), Stockton et al.
patent: 5252435 (1993-10-01), Tani et al.
patent: 5262944 (1993-11-01), Weisner et al.
patent: 5435646 (1995-07-01), McArthur
patent: 5444637 (1995-08-01), Smesny et al.
patent: 5516608 (1996-05-01), Hobbs et al.
patent: 5564889 (1996-10-01), Araki
patent: 5635409 (1997-06-01), Moslehi
patent: 5920478 (1999-07-01), Ekblad et al.
patent: 5926690 (1999-07-01), Toprac et al.
patent: 5969639 (1999-10-01), Lauf et al.
patent: 5970313 (1999-10-01), Rowland et al.
patent: 6010538 (2000-01-01), Sun et al.
patent: 6033922 (2000-03-01), Rowland et al.
patent: 6075909 (2000-06-01), Ressl
patent: 6100506 (2000-08-01), Colelli, Jr. et al.
patent: 6140833 (2000-10-01), Flietner et al.
patent: 6190040 (2001-02-01), Renken et al.
patent: 6191394 (2001-02-01), Shirakawa et al.
patent: 6229116 (2001-05-01), Shirakawa et al.
patent: 6235439 (2001-05-01), Whiting
patent: 6285971 (2001-09-01), Shah et al.
patent: 6313903 (2001-11-01), Ogata
patent: 6325536 (2001-12-01), Renken et al.
patent: 6368883 (2002-04-01), Bode et al.
patent: 6377130 (2002-04-01), Haman
patent: 6378378 (2002-04-01), Fisher
patent: 6472240 (2002-10-01), Akram et al.
patent: 6528331 (2003-03-01), Bode et al.
patent: 6535774 (2003-03-01), Bode et al.
patent: 6542835 (2003-04-01), Mundt
patent: 6553227 (2003-04-01), Yagisawa et al.
patent: 6553277 (2003-04-01), Yagisawa et al.
patent: 6617553 (2003-09-01), Ho et al.
patent: 6698009 (2004-02-01), Pasadyn et al.
patent: 6718224 (2004-04-01), Firth et al.
patent: 6741903 (2004-05-01), Bode et al.
patent: 6748280 (2004-06-01), Zou et al.
patent: 6766283 (2004-07-01), Goldman et al.
patent: 6957201 (2005-10-01), Alhadef et al.
patent: 6968253 (2005-11-01), Mack et al.
patent: 2001/0014520 (2001-08-01), Usui et al.
patent: 2002/0078770 (2002-06-01), Hunter
patent: 2002/0109590 (2002-08-01), Parsons
patent: 2002/0148307 (2002-10-01), Jonkers
patent: 2002/0161557 (2002-10-01), Freed
patent: 2002/0172097 (2002-11-01), Freed
patent: 2002/0177916 (2002-11-01), Poolla
patent: 2002/0177917 (2002-11-01), Poolla
patent: 2002/0193957 (2002-12-01), Freed
patent: 2004/0015460 (2004-01-01), Alhadef et al.
patent: 2004/0031340 (2004-02-01), Renken
patent: 2004/0107066 (2004-06-01), Poolla et al.
patent: 2004/0122636 (2004-06-01), Kostantinos
patent: 2004/0131226 (2004-07-01), Poolla
patent: 2004/0225462 (2004-11-01), Renken et al.
patent: 2004/0249604 (2004-12-01), Poolla et al.
patent: 2004/0267501 (2004-12-01), Freed
patent: 2005/0267606 (2005-12-01), Bartlett, Jr. et al
Cao, Liyu et al., Output Feedback Stabilization of Linear Systems with A Singular Perturbation Model, May 2002, Proceedings of the American Control Conference, pp. 1627-1632.
Sesak, John et al., Sensitivity-Constrained Linear Optimal Control via Forced Singular Perturbation Model Reduction, 1978 IEEE, pp. 1145-1146.

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