Methods of and apparatuses for controlling process profiles

Details Methods of and apparatuses for controlling process profiles Methods of and apparatuses for controlling process profiles

2008-07-22

2008-07-22

Cabrera, Zoila E (Department: 2123)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S109000

Reexamination Certificate

active

07403834

ABSTRACT:
Presented are methods and apparatus for controlling the processing of a substrate during a process step that is sensitive to one or more process conditions. One embodiment includes a method performed with corresponding apparatus that includes a controller. One step includes constructing a perturbation model relating changes in control parameters for the apparatus to one or more resulting changes in the process. The method also includes the step of using the perturbation model with at least one of a performance objective and a constraint to derive optimized control parameters for the controller. Another step in the method includes operating the controller with the optimized control parameters. Another embodiment includes an apparatus for processing substrates where the apparatus comprises optimized control parameters.

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