Methods for uniform metal impregnation into a nanoporous...

Coating processes – Immersion or partial immersion

Reexamination Certificate

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C427S443200

Reexamination Certificate

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07608305

ABSTRACT:
The methods, systems400and apparatus disclosed herein concern metal150impregnated porous substrates110, 210. Certain embodiments of the invention concern methods for producing metal-coated porous silicon substrates110, 210that exhibit greatly improved uniformity and depth of penetration of metal150deposition. The increased uniformity and depth allow improved and more reproducible Raman detection of analytes. In exemplary embodiments of the invention, the methods may comprise oxidation of porous silicon110, immersion in a metal salt solution130, drying and thermal decomposition of the metal salt140to form a metal deposit150. In other exemplary embodiments of the invention, the methods may comprise microfluidic impregnation of porous silicon substrates210with one or more metal salt solutions130. Other embodiments of the invention concern apparatus and/or systems400for Raman detection of analytes, comprising metal-coated porous silicon substrates110, 210prepared by the disclosed methods.

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