Methods for the formation of a silicon oxide film

Details Methods for the formation of a silicon oxide film Methods for the formation of a silicon oxide film

1994-01-26

1995-01-10

Lusignan, Michael

Coating processes

Heat decomposition of applied coating or base material

427228, 427377, 427379, 427387, 4273977, 437235, 437238, B05D 302

Patent

active

053805550

ABSTRACT:
Disclosed is a method for the formation of ceramic silicon oxide films on substrate surfaces wherein said films are thick, free of cracks and pinholes, and insoluble in organic solvents. These films are formed by coating the surface of a substrate with a silicon resin having the general formula

REFERENCES:
patent: 5118530 (1992-06-01), Hanneman et al.
patent: 5145723 (1992-09-01), Ballance et al.

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