Methods for selective integration of airgaps and devices...

Details Methods for selective integration of airgaps and devices... Methods for selective integration of airgaps and devices...

2006-05-02

2006-05-02

Fourson, George (Department: 2823)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S690000, C438S691000, C438S705000, C438S725000, C438S624000, C438S639000, C438S638000, C438S421000, C438S422000

Reexamination Certificate

active

07037851

ABSTRACT:
Method for the production of airgaps in a semiconductor device, the semiconductor device comprising a stack of layers, the stack of layers comprising at least one iteration of a sub-stack of layers.

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European Search Report for EP 04 44 7219.9, application of Interuniversitair Micro-Elektronica Centrum, dated Feb. 9, 2005. Includes Abstract.
European Search Report for EP 04 44 7220.7, application of Interuniversitair Micro-Elektronica Centrum, dated Feb. 9, 2005. Includes Abstract.

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