Coating processes – Nonuniform coating – Mask or stencil utilized
Reexamination Certificate
2011-07-12
2011-07-12
Chen, Bret (Department: 1715)
Coating processes
Nonuniform coating
Mask or stencil utilized
C427S569000, C427S571000, C204S192100, C204S192120, C117S095000, C117S103000, C117S104000, C117S108000, C118S720000, C118S721000
Reexamination Certificate
active
07976899
ABSTRACT:
Embodiments of the invention include a selective deposition method that allows for coating of selective portions of an object, such as an electronic device, and inhibits coating of other selective portions of the object, such as the electric contacts. The selective deposition method includes providing a web to transport the object through a deposition chamber. The web may include and reference mechanisms to register the object relative to the web. The method further includes providing deposition material and a shadow mask that has open spaces in it to inhibit coating selective portions of the object. The deposition material serves as the coating material.
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Duggal Anil Raj
Erlat Ahmet Gun
McConnelee Paul Alan
Rogojevic Svetlana
Yan Min
Chen Bret
General Electric Company
Gioeni Mary Louise
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