Abrading – Abrading process – Utilizing fluent abradant
Reexamination Certificate
2006-11-14
2006-11-14
Ackun, Jr., Jacob K. (Department: 3723)
Abrading
Abrading process
Utilizing fluent abradant
C134S001000, C451S057000
Reexamination Certificate
active
07134941
ABSTRACT:
A method of plasma assisted CO2cleaning for dry removal of residual photoresist and sidewall polymer with an etch gas mixture comprising fluorine containing gas, oxygen and hydrogen in N2or H2O. The process removes polymer residues present on a metal layer on a substrate and on the sidewalls of metal lines and inhibits chlorine-based corrosion while being very selective to exposed Ti, TiN, Al and SiO2. The invention is particularly suited for removing post metal etch polymer residue from top and sidewall of metal lines.
REFERENCES:
patent: 4466964 (1984-08-01), Goddio
patent: 4793103 (1988-12-01), Baumgart
patent: 4806171 (1989-02-01), Whitlock et al.
patent: 4854091 (1989-08-01), Hashish
patent: 4962891 (1990-10-01), Layden
patent: 5015331 (1991-05-01), Powell
patent: 5049365 (1991-09-01), Okabayashi
patent: 5062898 (1991-11-01), McDermott et al.
patent: 5074083 (1991-12-01), Kanno
patent: 5107764 (1992-04-01), Gasparrini
patent: 5108512 (1992-04-01), Goffnett et al.
patent: 5209028 (1993-05-01), McDermott et al.
patent: 5217925 (1993-06-01), Ogawa et al.
patent: 5315793 (1994-05-01), Peterson et al.
patent: 5354384 (1994-10-01), Sneed et al.
patent: 5364472 (1994-11-01), Heyns et al.
patent: 5366156 (1994-11-01), Bauer
patent: 5378312 (1995-01-01), Gifford
patent: 5380401 (1995-01-01), Jones
patent: 5417768 (1995-05-01), Smith, Jr. et al.
patent: 5456629 (1995-10-01), Bingham
patent: 5456759 (1995-10-01), Stanford
patent: 5482564 (1996-01-01), Douglas et al.
patent: 5505219 (1996-04-01), Lansberry
patent: 5514024 (1996-05-01), Goenka
patent: 5564159 (1996-10-01), Treiber
patent: 5571335 (1996-11-01), Lloyd
patent: 5616067 (1997-04-01), Goenka
patent: 5620673 (1997-04-01), Herden et al.
patent: 5632150 (1997-05-01), Henzler
patent: 5651723 (1997-07-01), Bjornard
patent: 5651834 (1997-07-01), Jon et al.
patent: 5669251 (1997-09-01), Townsend et al.
patent: 5715852 (1998-02-01), Jepsen
patent: 5733174 (1998-03-01), Bingham et al.
patent: 5754580 (1998-05-01), Kotani et al.
patent: 5765578 (1998-06-01), Brandt et al.
patent: 5766061 (1998-06-01), Bowers
patent: 5766368 (1998-06-01), Bowers
patent: 5775127 (1998-07-01), Zito
patent: 5794854 (1998-08-01), Yie
patent: 5795831 (1998-08-01), Nakayama et al.
patent: 5804826 (1998-09-01), Borden et al.
patent: 5806544 (1998-09-01), Kosic
patent: 5810942 (1998-09-01), Narayanswami
patent: 5833918 (1998-11-01), Matossian et al.
patent: 5836809 (1998-11-01), Kosic
patent: 5837064 (1998-11-01), Bowers
patent: 5853128 (1998-12-01), Bowen et al.
patent: 5853962 (1998-12-01), Bowers
patent: 5858107 (1999-01-01), Chao et al.
patent: 5863170 (1999-01-01), Boitnott et al.
patent: 5882489 (1999-03-01), Bersin et al.
patent: 5908319 (1999-06-01), Xu et al.
patent: 5914278 (1999-06-01), Boitnott et al.
patent: 5928434 (1999-07-01), Goenka
patent: 5931721 (1999-08-01), Rose
patent: 5961732 (1999-10-01), Patrin et al.
patent: 5967156 (1999-10-01), Rose
patent: 5976264 (1999-11-01), McCullough
patent: 5989355 (1999-11-01), Brandt et al.
patent: 6004399 (1999-12-01), Wong
patent: 6066032 (2000-05-01), Borden et al.
patent: 6099396 (2000-08-01), Krone-Schmidt
patent: 6126524 (2000-10-01), Shepherd
patent: 6187684 (2001-02-01), Farber et al.
patent: 6200393 (2001-03-01), Romack
patent: 6203406 (2001-03-01), Rose
patent: 6273790 (2001-08-01), Neese et al.
patent: 6280585 (2001-08-01), Obinata et al.
patent: 6296716 (2001-10-01), Haerle
patent: 6303047 (2001-10-01), Aronowitz
patent: 6412497 (2002-07-01), Li
patent: 6530823 (2003-03-01), Ahmadi
patent: 6531436 (2003-03-01), Sahbari
patent: 6536059 (2003-03-01), McClain et al.
patent: 6543462 (2003-04-01), Lewis
patent: 6558475 (2003-05-01), Jur
patent: 6565667 (2003-05-01), Haerle
patent: 6572457 (2003-06-01), DePalma
patent: 6719613 (2004-04-01), Ahmadi
patent: 6764385 (2004-07-01), Boumerzoug
patent: 6838015 (2005-01-01), Cotte
patent: 6945853 (2005-09-01), Ahmadi
patent: 6949145 (2005-09-01), Banerjee
patent: 2001/0024769 (2001-09-01), Donoghue et al.
patent: 2004/0237997 (2004-12-01), Rui et al.
High Pressure Cleaning System for Disks, IBM Technical Disclosure Bulletin, Jan. 1983.
Boumerzoug Mohamed
Tannous Adel George
Ackun Jr. Jacob K.
Loudermilk & Associates
Nanoclean Technologies, Inc.
LandOfFree
Methods for residue removal and corrosion prevention in a... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Methods for residue removal and corrosion prevention in a..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods for residue removal and corrosion prevention in a... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3682737