Methods for removing silicon and silicon-nitride...

Details Methods for removing silicon and silicon-nitride... Methods for removing silicon and silicon-nitride...

2007-09-11

2007-09-11

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

With means to movably mount or movably support the work or...

C134S137000, C134S152000, C134S157000, C134S16600C, C134S170000, C134S201000, C134S902000, C438S905000, C156S345230

Reexamination Certificate

active

11054794

ABSTRACT:
Described are methods, systems, and chemistries for removing layers of stubborn silicon and silicon-nitride contamination layers from the inside surfaces of such articles as deposition tubes. In such embodiments, a tube to be cleaned is gently rolled on it side while a portion the tube's interior surface is exposed to an etchant. The tube is only partially filled with etchant to reduce the requisite etchant volume, and the rolling motion evenly exposes the contaminated inner surface to the etchant.

REFERENCES:
patent: 2163276 (1939-06-01), Fritzsche et al.
patent: 2273603 (1942-02-01), Verden
patent: 3420712 (1969-01-01), Parsons
patent: 6607605 (2003-08-01), Tan
patent: 80924 (1970-02-01), None
patent: 1323416 (1973-07-01), None
patent: 54-138827 (1979-10-01), None
patent: 4-180875 (1992-06-01), None

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