Methods for patterning polymer films, and use of the methods

Etching a substrate: processes – Adhesive or autogenous bonding of two or more... – Removing at least one of the self-sustaining preforms or a...

Reexamination Certificate

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C216S054000, C216S067000, C427S536000, C427S552000, C427S271000, C427S393500, C101S483000, C101S492000

Reexamination Certificate

active

06966997

ABSTRACT:
In a method for patterning a polymer film forming a coating on a material surface, a thin film of polymer is deposited on the surface and the patterning takes place by applying to the material surface a stamp made of an elastomeric material in conformal contact with the surface of the thin film, such that portions thereof contacting one or more protruding elements of the elastomeric stamp formed by one or more indentations thereof, are attached to the protruding element or elements and removed from the material surface with the stamp. In a method for transferring a patterned polymer film onto a material surface, a thin film polymer is deposited on a stamp surface and the stamp is applied in conformal contact with the material surface, such that thin film of polymer is transferred thereto from one or more protruding elements of the elastomeric stamp formed by at least one indentation thereof, thus leaving a patterned thin film of polymer on the material surface when removing the stamp therefrom. Use for patterning an etched resist in the form of a thin film of polymer on a gold layer.

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