Methods for normalizing error in photolithographic processes

Details Methods for normalizing error in photolithographic processes Methods for normalizing error in photolithographic processes

2011-06-07

2011-06-07

Jarrett, Ryan A (Department: 2121)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S110000

Reexamination Certificate

active

07957826

ABSTRACT:
A method for fabricating parts using a photolithography system, includes: performing a search of normalization data for an estimated dose operating point; and using the estimated dose operating point for fabrication of new parts.

REFERENCES:
patent: 6700950 (2004-03-01), Pellegrini et al.
patent: 6772034 (2004-08-01), Shi et al.
patent: 6873938 (2005-03-01), Paxton et al.
patent: 7225047 (2007-05-01), Al-Bayati et al.
patent: 2004/0181728 (2004-09-01), Pellegrini et al.
patent: 2007/0022401 (2007-01-01), Wang

Affiliated with

Also associated with

Rating

Methods for normalizing error in photolithographic processes does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Methods for normalizing error in photolithographic processes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods for normalizing error in photolithographic processes will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2705440