Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Patent
1997-03-25
1999-11-16
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
430 30, G03F 900
Patent
active
059854952
ABSTRACT:
Methods and apparatus are disclosed for exposing a reticle pattern onto a sensitive substrate (such as a sensitized semiconductor wafer) by projection-exposure at high focusing precision. According to the method, multiple evaluation marks are projected onto an area of the surface to form images of the evaluation marks. An image of a measurement mark is projected on or near at least some of the evaluation marks. Respective Z-direction displacements of each evaluation mark relative to a reference plane are detected by detecting a characteristic of the respective measurement mark that varies with a change in position of the measurement mark relative to the respective evaluation mark. Based on such measurements, an axial relationship of the projection-optical system relative to the substrate can be changed to place the substrate at a best-focus position before exposing the substrate with a reticle pattern. Associated apparatus are also disclosed.
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Okumura Masahiko
Wakamoto Shinji
Nikon Corporation
Young Christopher G.
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