Printing – Processes – Condition responsive
Reexamination Certificate
2006-07-18
2006-07-18
Hirshfeld, Andrew H. (Department: 2854)
Printing
Processes
Condition responsive
C356S402000, C356S407000
Reexamination Certificate
active
07077064
ABSTRACT:
A process is disclosed to measure or monitor ink concentration or ink thickness of an ink film as printed on a printing press, which consists of measuring light reflected from the ink film and the ink substrate.
REFERENCES:
patent: 4289405 (1981-09-01), Tobias
patent: 4494875 (1985-01-01), Schramm et al.
patent: 4671661 (1987-06-01), Ott
patent: 4690564 (1987-09-01), Morgenstern et al.
patent: 4971446 (1990-11-01), Kurata
patent: 5122977 (1992-06-01), Pfeiffer
patent: 5163012 (1992-11-01), Wuhrl et al.
patent: 5526285 (1996-06-01), Campo et al.
patent: 5724259 (1998-03-01), Seymour et al.
patent: 5767980 (1998-06-01), Wang et al.
patent: 5774225 (1998-06-01), Goldstein et al.
patent: 5821993 (1998-10-01), Robinson
patent: 6003967 (1999-12-01), Mazaki
patent: 6151064 (2000-11-01), Connolly et al.
patent: 6832550 (2004-12-01), Martin et al.
patent: 6901861 (2005-06-01), Adachi et al.
patent: 7000544 (2006-02-01), Riepenhoff
patent: 363118602 (1988-05-01), None
Stocka, D., “Are intervals of 20nm sufficient for industrial color measurement?”,COL-OUR 73, Adam Hilger, London, 453-456, (1973).
Billmeyer, F.W., Beasley, J. K., Sheldon, J. A., “Formulation of transparent colors with a digital computer”,Journal of the Optical Society of America, 50, 70-72, (1960).
Hamdan Wasseem H.
Hirshfeld Andrew H.
Kramer Levin Naftalis & Frankel LLP
Sun Chemical Corporation
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