Methods for manufacturing porous nuclear fuel elements for...

Details Methods for manufacturing porous nuclear fuel elements for... Methods for manufacturing porous nuclear fuel elements for...

2006-05-17

2010-02-23

Lightfoot, Elena T (Department: 1792)

Coating processes

Radioactive base or coating

C427S006000, C427S226000, C427S227000, C427S249100, C427S249200, C427S249170, C427S255110, C427S255120, C427S255230, C427S255280

Reexamination Certificate

active

07666463

ABSTRACT:
Methods for manufacturing porous nuclear fuel elements for use in advanced high temperature gas-cooled nuclear reactors (HTGR's). Advanced uranium bi-carbide, uranium tri-carbide and uranium carbonitride nuclear fuels can be used. These fuels have high melting temperatures, high thermal conductivity, and high resistance to erosion by hot hydrogen gas. Tri-carbide fuels, such as (U,Zr,Nb)C, can be fabricated using chemical vapor infiltration (CVI) to simultaneously deposit each of the three separate carbides, e.g., UC, ZrC, and NbC in a single CVI step. By using CVI, a thin coating of nuclear fuel may be deposited inside of a highly porous skeletal structure made, for example, of reticulated vitreous carbon foam.

REFERENCES:
patent: 2725284 (1955-11-01), Polissar
patent: 3073717 (1963-01-01), Pyle et al.
patent: 3781173 (1973-12-01), Napier et al.
patent: 3799882 (1974-03-01), Holland
patent: 4336280 (1982-06-01), Muller
patent: 4759911 (1988-07-01), Bingham et al.
patent: 5372380 (1994-12-01), Duffy et al.
patent: 6103149 (2000-08-01), Stankiewicz

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