Methods for making photodectors

Fishing – trapping – and vermin destroying

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148DIG102, 148DIG143, 437 3, 437187, 437924, H01L 2100, H01L 3118

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active

050266608

ABSTRACT:
A shadow-masking process for manufacturing low dark current photodetectors with low noise characteristics is disclosed. The process includes shadow-masking a semiconductor wafer by positioning a patterned shadow-mask on a surface of the wafer. The shadow-mask is patterned with, for example, circular openings or stripe openings. Layers, such as metallization layers to form metallic contacts or anti-reflection layers are deposited onto the wafer through the patterned openings in the shadow-masks. This shadow-masking process may be used in the production of any semiconductor device requiring patterned layers.

REFERENCES:
patent: 3382115 (1968-05-01), Carter et al.
patent: 3928094 (1975-12-01), Angell
patent: 3969746 (1976-07-01), Kendall et al.
patent: 4021276 (1977-05-01), Cho et al.
patent: 4282541 (1981-08-01), Tsang
patent: 4335503 (1982-06-01), Evans, Jr. et al.
patent: 4514582 (1985-04-01), Tiedje et al.
patent: 4547958 (1985-10-01), Hafford
patent: 4910166 (1990-03-01), Dholakia

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