Methods for improving positioning performance of electron...

Details Methods for improving positioning performance of electron... Methods for improving positioning performance of electron...

2007-02-06

2007-02-06

Bashore, Alain L. (Department: 1762)

Coating processes

Magnetic base or coating

Magnetic coating

C427S127000, C427S128000, C427S131000

Reexamination Certificate

active

10845956

ABSTRACT:
The present invention discloses a method for the production of sub-micron structures on magnetic materials using electron beam lithography. A subtractive process is disclosed wherein a portion of a magnetic material layer is removed from the substrate using conventional lithography, and the remaining portion of the magnetic material layer is patterned by e-beam lithography. A additive process is also disclosed wherein a thin magnetic seed layer is deposited on the substrate, a portion of which is removed by conventional lithography and replaced with a non-magnetic conducting layer. The remaining portion of magnetic seed layer is patterned by e-beam lithography and the final magnetic structure produced by electroplating.

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