Optics: measuring and testing – Position or displacement
Reexamination Certificate
2005-10-11
2005-10-11
Pham, Hoa Q. (Department: 2877)
Optics: measuring and testing
Position or displacement
C356S625000, C250S548000, C430S005000
Reexamination Certificate
active
06954275
ABSTRACT:
Described are high precision gap and orientation measurement methods between a template and a substrate used in imprint lithography processes. Gap and orientation measurement methods presented here include uses of broad-band light based measuring techniques.
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Bailey Todd
Choi Byung J.
Colburn Matthew
Ekerdt John
Sreenivasan S. V.
Boards of Regents, The University of Texas System
Brooks Kenneth C.
Nguyen Sang H.
Pham Hoa Q.
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