Semiconductor device manufacturing: process – Having integral power source
Reexamination Certificate
2008-03-24
2010-11-16
Coleman, W. David (Department: 2823)
Semiconductor device manufacturing: process
Having integral power source
C257SE27125, C136S256000
Reexamination Certificate
active
07833808
ABSTRACT:
Methods for forming a photovoltaic cell electrode structure, wherein the photovoltaic cell includes a semiconductor substrate having a passivation layer thereon, includes providing a plurality of contact openings through the passivation layer to the semiconductor substrate, selectively plating a contact metal into the plurality of contact openings to deposit the contact metal, depositing a metal containing material on the deposited contact metal, and firing the deposited contact metal and the deposited metal containing material. The metal containing material may include a paste containing a silver or silver alloy along with a glass frit and is substantially free to completely free of lead. The methods may also use light activation of the passivation layer or use seed layers to assist in the plating.
REFERENCES:
patent: 4235644 (1980-11-01), Needes
patent: 5011565 (1991-04-01), Dube et al.
patent: 7291380 (2007-11-01), Nyholm et al.
patent: 2004/0200520 (2004-10-01), Mulligan et al.
patent: 2005/0022862 (2005-02-01), Cudzinovic et al.
patent: 2005/0034755 (2005-02-01), Okada et al.
patent: 2005/0189013 (2005-09-01), Hartley
patent: 2006/0102228 (2006-05-01), Sridharan et al.
patent: 2007/0098996 (2007-05-01), Frey et al.
patent: 2007/0169806 (2007-07-01), Fork et al.
patent: 2007/0221270 (2007-09-01), Watsuji et al.
patent: 2009/0020156 (2009-01-01), Ohtsuka et al.
patent: 2009/0025786 (2009-01-01), Rohatgi et al.
U.S. Appl. No. 11/962,987, filed Dec. 21, 2007 (Baomin Xu et al.).
D. Meier et al.; “Solar Cell Contacts”; IEEE; pp. 904-910 (1982).
Zheng-Chun Liu et al.; “Self-assembly monolayer of mercaptopropyitrimethoxysilane for electroless deposition of Ag”; Materials Chemistry and Physics; vol. 82; pp. 301-305 (2003).
C. R. K. Marrian et al.; “Low voltage electron beam lithography in self-assembled ultrathin films with the scanning tunneling microscope”; Appl. Phys. Lett.; vol. 64; pp. 390-392 (Jan. 17, 1994).
Fork David K.
Littau Karl A.
Xu Baomin
Coleman W. David
Oliff & Berridg,e PLC
Palo Alto Research Center Incorporated
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