Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
Reexamination Certificate
2005-04-19
2005-04-19
Hiteshew, Felisa (Department: 1765)
Single-crystal, oriented-crystal, and epitaxy growth processes;
Forming from vapor or gaseous state
With decomposition of a precursor
C117S105000
Reexamination Certificate
active
06881262
ABSTRACT:
A method of forming a component is disclosed. The method includes: providing a core containing a porous material; infiltrating the core with silicon carbide; and removing the porous material of the core, thereby forming a porous substrate containing silicon carbide.
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Chang Han C.
Haerle Andrew G.
Field, III Thomas G.
Hiteshew Felisa
Saint-Gobain Ceramics & Plastics, Inc.
Toler Larson & Abel, LLP
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